Post-Copper Etch Cleaning Solution
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Post-Copper Etch Cleaning Solution

Cat No:ECCC-0008

Description

Post-copper etch cleaning solution is designed for the removal of etch residues in copper interconnect damascene processes of integrated circuits. This cleaning solution provides excellent etch residue removal capability with low defectivity and cost-effective performance. The product has been qualified for multiple logic chip technology nodes, 3D NAND and DRAM memory chips, CIS specialty processes, and 2.5D/3D packaging processes, and is in mass production.

Basic Information

Primary Applications • Copper interconnect damascene etch residue removal • Logic chip multiple technology nodes • 3D NAND and DRAM memory chips • CIS specialty processes • 2.5D and 3D packaging processes
Product Type Cleaning Solution / Post-Etch Cleaner
Application Nodes Multiple logic nodes, 3D NAND, DRAM, CIS, 2.5D/3D
Manufacturing Process Copper damascene etch process cleaning
Key Benefits • Excellent etch residue removal capability • Low defectivity performance • Cost-effective solution • Broad application across multiple process types

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For Research or Industrial Raw Materials, Not For Personal Medical Use!

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